{"total_count":1,"results":[{"id":73730,"original_title":"Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California","title_alternative":"Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing 5","title_transcription":"  ","title_alternative_transcription":null,"pub_date":"1995","statement_of_responsibility":"John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International","creators":[{"full_name":"Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing Symposium"},{"full_name":"Warlaumont, John M."},{"full_name":"Society of Photo-optical Instrumentation Engineers"},{"full_name":"Semiconductor Equipment and Materials International"}],"contributors":[],"publishers":[{"full_name":"SPIE"}],"publication_place":null,"extent":"vii, 450 p. ; 28 cm","dimensions":null,"identifiers":[{"identifier_type":"isbn","body":"9780819417855"}],"subjects":[],"classfifications":[{"classification_type":"udc","term":"621.385"}],"access_address":null,"items":[{"item_identifier":"216893","shelf":"単行書22"}],"created_at":"1999-05-19T08:58:27.000+09:00","updated_at":"2025-12-15T09:44:30.202+09:00"}]}