{"total_count":1,"results":[{"id":42474,"original_title":"Glow discharge processes : sputtering and plasma etching","title_alternative":null,"title_transcription":"  ","title_alternative_transcription":null,"pub_date":"1980","statement_of_responsibility":"Brian Chapman","creators":[{"full_name":"Chapman, Brian N."}],"contributors":[],"publishers":[{"full_name":"Wiley"}],"publication_place":null,"extent":"xv, 406 p. ; 24 cm","dimensions":null,"identifiers":[{"identifier_type":"isbn","body":"9780471078289"}],"subjects":[],"classfifications":[],"access_address":null,"items":[{"item_identifier":"216238","shelf":"単行書21"}],"created_at":"1901-01-01T09:00:00.000+09:00","updated_at":"2025-12-15T09:43:24.818+09:00"}]}