<?xml version="1.0" encoding="UTF-8"?>
<modsCollection xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns="http://www.loc.gov/mods/v3">
<titleInfo>
  <title>Ultra clean processing of silicon surfaces 2000 : proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000), held in Ostend, Belgium, September 18-20, 2000</title>
</titleInfo>
<titleInfo type="alternative">
  <title/>
</titleInfo>
<name type="personal">
  <namePart>International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS)</namePart>
  <role>
    <roleTerm type="text" authority="marcrelator">creator</roleTerm>
  </role>
</name>
<name type="personal">
  <namePart>Heyns, Marc</namePart>
  <role>
    <roleTerm type="text" authority="marcrelator">creator</roleTerm>
  </role>
</name>
<name type="personal">
  <namePart>Mertens, Paul</namePart>
  <role>
    <roleTerm type="text" authority="marcrelator">creator</roleTerm>
  </role>
</name>
<name type="personal">
  <namePart>Meuris, Marc</namePart>
  <role>
    <roleTerm type="text" authority="marcrelator">creator</roleTerm>
  </role>
</name>
<typeOfResource>text</typeOfResource>
<originInfo>
  <publisher>Scitec Publications</publisher>
  <dateIssued/>
  <frequency>unknown</frequency>
</originInfo>
<language>
  <languageTerm authority="iso639-2b" type="code">eng</languageTerm>
</language>
<physicalDescription>
  <form authority="marcform">volume</form>
  <extent>xiii, 321 p. ; 25 cm</extent>
</physicalDescription>
<subject>
</subject>
<classification authority="udc">548.526</classification>
<abstract/>
<note>Includes bibliographical references and indexes</note>
<identifier type="isbn">9783908450573</identifier>
<recordInfo>
  <recordCreationDate>2000-12-26 19:03:04 +0900</recordCreationDate>
  <recordChangeDate>2025-12-15 09:52:45 +0900</recordChangeDate>
  <recordIdentifier>https://library.nims.go.jp/manifestations/42809</recordIdentifier>
</recordInfo>
<titleInfo>
  <title>Ultra clean processing of silicon surfaces : proceedings of the Fourth International Symposium on ultra clean processing of silicon surfaces held in Ostend, Belgium, September 21-23, 1998</title>
</titleInfo>
<titleInfo type="alternative">
  <title/>
</titleInfo>
<name type="personal">
  <namePart>Heyns, Marc</namePart>
  <role>
    <roleTerm type="text" authority="marcrelator">creator</roleTerm>
  </role>
</name>
<name type="personal">
  <namePart>Meuris, Marc</namePart>
  <role>
    <roleTerm type="text" authority="marcrelator">creator</roleTerm>
  </role>
</name>
<name type="personal">
  <namePart>Mertens, Paul</namePart>
  <role>
    <roleTerm type="text" authority="marcrelator">creator</roleTerm>
  </role>
</name>
<typeOfResource>text</typeOfResource>
<originInfo>
  <publisher>Scitec Publications Ltd</publisher>
  <dateIssued/>
  <frequency>unknown</frequency>
</originInfo>
<language>
  <languageTerm authority="iso639-2b" type="code">eng</languageTerm>
</language>
<physicalDescription>
  <form authority="marcform">volume</form>
  <extent>xiv, 301 p. ; 25 cm</extent>
</physicalDescription>
<subject>
</subject>
<classification authority="udc">548.526</classification>
<abstract/>
<note>Volumes 65-66 of Solid State Phenomena, ISSN1012-0394//Includes index</note>
<identifier type="isbn">9783908450405</identifier>
<recordInfo>
  <recordCreationDate>1999-05-26 00:00:49 +0900</recordCreationDate>
  <recordChangeDate>2025-12-15 09:52:44 +0900</recordChangeDate>
  <recordIdentifier>https://library.nims.go.jp/manifestations/35355</recordIdentifier>
</recordInfo>
</modsCollection>
