Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California - Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing Symposium; Warlaumont, John M.; Society of Photo-optical Instrumentation Engineers; Semiconductor Equipment and Materials International (SPIE)
Includes bibliographical references and index