Handbook of chemical vapor deposition (CVD) : principles, technology, and applications Pierson, Hugh O. creator text Noyes Publications 1999-01-01 00:00:00 +0900 unknown eng
volume
xxiv, 482 p. ; 25 cm 621.793 9780815514329 2024-02-19 16:26:08 +0900 2025-12-15 09:24:00 +0900 https://library.nims.go.jp/manifestations/132607 Handbook of sputter deposition technology : principles, technology, and applications Wasa, Kiyotaka creator Hayakawa, Shigeru creator text Noyes Publications 1992-01-01 00:00:00 +0900 unknown eng
volume
xii, 304 p. ; 25 cm 539.23 9780815512806 2024-01-16 11:19:54 +0900 2025-12-15 09:33:06 +0900 https://library.nims.go.jp/manifestations/132431 Wide bandgap semiconductors : growth, processing and applications Processing of wide band gap semiconductors Pearton, S. J. creator text William Andrew Noyes Publications unknown eng
volume
xx, 571 p. ; 25 cm 546.261 Includes bibliographical references 9780815514398 2008-07-23 02:04:00 +0900 2025-12-15 09:38:47 +0900 https://library.nims.go.jp/manifestations/76907 Handbook of molecular force spectroscopy </titleInfo> <name type="personal"> <namePart>Noy, Aleksandr</namePart> <role> <roleTerm type="text" authority="marcrelator">creator</roleTerm> </role> </name> <name type="personal"> <namePart>edited by Aleksandr Noy</namePart> </name> <typeOfResource>text</typeOfResource> <originInfo> <publisher>Springer</publisher> <dateIssued/> <frequency>unknown</frequency> </originInfo> <language> <languageTerm authority="iso639-2b" type="code">eng</languageTerm> </language> <physicalDescription> <form authority="marcform">volume</form> <extent>xii, 291p., [15] p. of plates ; 26cm</extent> </physicalDescription> <subject> </subject> <abstract/> <note>Includes bibliographical references and index</note> <identifier type="isbn">9780387499871</identifier> <recordInfo> <recordCreationDate>2008-07-01 01:45:56 +0900</recordCreationDate> <recordChangeDate>2025-12-15 09:36:50 +0900</recordChangeDate> <recordIdentifier>https://library.nims.go.jp/manifestations/76924</recordIdentifier> </recordInfo> <titleInfo> <title>Chemical Vapor Deposition of Tungsten and Tungsten Silicides : For VLSI/ULSI Applications </titleInfo> <name type="personal"> <namePart>by John E.J. 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