manifestation_id	original_title	title_alternative	title_transcription	statement_of_responsibility	serial	manifestation_identifier	creator	contributor	publisher	date_of_publication	year_of_publication	publication_place	manifestation_created_at	manifestation_updated_at	carrier_type	content_type	frequency	language	isbn	issn	ncid	volume_number	volume_number_string	edition	edition_string	issue_number	issue_number_string	serial_number	extent	start_page	end_page	dimensions	height	width	depth	manifestation_price	access_address	manifestation_required_role	abstract	description	identifier:unknown	identifier:nbn	identifier:isbn10	identifier:iss_itemno	identifier:online_isbn	identifier:print_isbn	identifier:print_issn	identifier:online_issn	identifier:escidoc	identifier:nims	series_statement_id	series_statement_original_title	series_statement_title_subseries	series_statement_title_subseries_transcription	series_statement_title_transcription	series_statement_creator	series_statement_volume_number	series_statement_series_master	series_statement_root_manifestation_id	series_statement_manifestation_id	series_statement_position	series_statement_note	series_statement_created_at	series_statement_updated_at	subject:ndlsh	subject:unknown	subject:bsh	classification:ndc8	classification:ndc9	classification:udc	doi	jpno	ncid	lccn	iss_itemno	item_id	item_identifier	binding_item_identifier	call_number	library	shelf	item_note	accepted_at	acquired_at	item_created_at	item_updated_at
73714	LSI製造におけるプロセス高性能化技術 : ガス供給システム  第1編		LSI セイゾウ ニオ ケル プロセス コウセイノウ ケ ギジュツ:ガス キョウキュウ システム  			920419	半導体基盤技術研究会 編; [大見 忠弘, 新田 雄久 監修]	半導体基盤技術研究会 編; [大見 忠弘, 新田 雄久 監修]//半導体基盤技術研究会	リアライズ社	1989-01-01 00:00:00 +0900			2006-11-07 00:26:12 +0900	2024-03-04 14:01:38 +0900	volume	text	unknown	Japanese	""	""			Technology						224p; 27cm	1	224		27.0					Guest			""	""	""	""	""	""	""	""	""	""	139	Ultra Clean Technology	""	""	""	""	""	""	""	73714	77	""	2011-03-30 23:49:13 +0900	2013-04-23 00:04:45 +0900	""	""	""	""	""	661.9						74072	210874		661.9|H|12350	sengen	S00130202			2006-12-01 00:00:00 +0900	2010-12-16 02:30:38 +0900	2024-03-04 14:01:38 +0900