manifestation_id original_title title_alternative title_transcription statement_of_responsibility manifestation_identifier creator contributor publisher date_of_publication pub_date year_of_publication publication_place manifestation_created_at manifestation_updated_at carrier_type content_type frequency language isbn issn doi jpno ncid lccn iss_itemno volume_number volume_number_string edition edition_string issue_number issue_number_string serial_number extent start_page end_page dimensions height width depth manifestation_price access_address manifestation_required_role abstract description identifier:unknown identifier:nbn identifier:isbn10 identifier:iss_itemno identifier:online_isbn identifier:print_isbn identifier:print_issn identifier:online_issn identifier:escidoc identifier:nims series_statement_id series_statement_original_title series_statement_title_subseries series_statement_title_subseries_transcription series_statement_title_transcription series_statement_creator series_statement_volume_number series_statement_series_master series_statement_root_manifestation_id series_statement_manifestation_id series_statement_position series_statement_note series_statement_created_at series_statement_updated_at subject:ndlsh subject:unknown subject:bsh classification:ndc8 classification:ndc9 classification:udc item_id item_identifier binding_item_identifier call_number library shelf item_note accepted_at acquired_at item_created_at item_updated_at 34839 Polarization analysis and applications to device technology : International Symposium on Polarization Analysis and Applications to Device Technology : 12-14 June, 1996, Yokahama, Japan Toru Yoshizawa, Hideshi Yokota, editors ; sponsored by SPIE Japan Chapter ... [et al.] ; published by SPIE--The International Society for Optical Engineering 921143 International Symposium on Polarization Analysis and Applications to Device Technology//Yoshizawa, Tōru//Yokota, Hideshi//Society of Photo-optical Instrumentation Engineers. Japan Chapter//Society of Photo-optical Instrumentation Engineers "" SPIE 1996 1996 2008-09-04 01:47:34 +0900 2025-12-15 09:28:53 +0900 volume text unknown English 9780819422712 "" BC06824243 xiii, 350 p. ; 28 cm 1 350 28.0 Guest "" "" "" "" "" "" "" "" "" "" 66750 Proceedings / SPIE -- the International Society for Optical Engineering "" "" "" "" v. 2873 "" "" 34839 13742 "" 2024-11-28 21:07:49 +0900 2025-11-28 13:04:07 +0900 "" "" "" "" "" 535.5 76496 211081 535.5|Y|ｷ 1599 namiki N00080203 2008-03-05 00:00:00 +0900 2010-12-16 02:42:39 +0900 2025-12-15 09:28:53 +0900 4550 Solid state lasers and nonlinear crystals : 5-7 February 1995 San Jose, California Proceedings SPIE—The International Society for Optical Engineering (Solid State Lasers and Nonlinear Crystals) Gregory J. Quarles, Leon Esterowitz, L. K. Cheng chairs/editors ; sponcered and published by SPIE--the International Society for Optical Engineering 64727 Quarles, Gregory J.//Esterowitz, Leon//Cheng, L. K.//Society of Photo-optical Instrumentation Engineers "" SPIE 1995 1995 2000-12-26 03:42:31 +0900 2025-12-15 09:28:26 +0900 volume text unknown English 9780819417268 "" BA28173009 xi, 418 p. ; 28 cm 1 418 28.0 Guest "" "" "" "" "" "" "" "" "" "" 62683 Proceedings "" "" "" SPIE -- the International Society for Optical Engineering v. 2379 "" "" 4550 10112 "" 2024-11-28 20:29:59 +0900 2025-10-15 15:07:18 +0900 "" "" "" "" "" 535 4884 523779 535||05244 namiki N00070406 1996-03-12 00:00:00 +0900 2010-12-15 20:37:00 +0900 2025-12-15 09:28:26 +0900 39631 Superconducting superlattices II, native and artificial : 20-22 July 1998, San Diego, California Ivan Bozovic, Davor Pavuna, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Oxxel GmbH Bremen (Germany) 35431 Bozovic, Ivan//Pavuna, Davor//Society of Photo-optical Instrumentation Engineers//Oxxel GmbH Bremen "" SPIE 1998 1998 2000-04-11 20:32:55 +0900 2025-12-15 09:30:59 +0900 volume text unknown English 9780819429353 0277786X BA74794822 x, 252 p. ; 28 cm 1 252 28.0 18354 Guest "" "" "" "" "" "" "" "" "" "" 67070 Proceedings "" "" "" SPIE -- the International Society for Optical Engineering v. 3480 "" "" 39631 14054 "" 2024-11-28 21:11:10 +0900 2025-11-28 13:04:07 +0900 "" "" "" "" "" 538.945 40757 218313 538.945|B|11053 namiki N00100105 2000-05-24 00:00:00 +0900 2010-12-15 23:38:26 +0900 2025-12-15 09:30:59 +0900 73730 Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing 5 John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International 33107 Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing Symposium//Warlaumont, John M.//Society of Photo-optical Instrumentation Engineers//Semiconductor Equipment and Materials International "" SPIE 1995 1999-05-19 08:58:27 +0900 2025-12-15 09:44:30 +0900 volume text unknown English 9780819417855 "" BC06573165 vii, 450 p. ; 28 cm 1 450 28.0 Guest "" "" "" "" "" "" "" "" "" "" 69441 Proceedings "" "" "" SPIE -- the International Society for Optical Engineering v. 2437 "" "" 73730 16396 "" 2024-11-28 21:36:49 +0900 2025-11-28 13:04:07 +0900 "" "" "" "" "" 621.385 38329 216893 621.385.833|Ｗ|9835 namiki N00220403 1996-03-05 00:00:00 +0900 2010-12-15 23:26:04 +0900 2025-12-15 09:44:30 +0900