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Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics : Symposium held April 5-8, 1999,San Francisco, California, U.S.A. ; MRS Vol.567 Vol.567 Vol.567
editors, H.R. Huff, C.A. Richter, M.L. Green [et al.]
Materials Research Society (MRS)
(1999)
UDC: MRS
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