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液滴工ピタキシィ法によるGaAs ドットの自己形成
Contributor: 物質・材料研究機構 / National Institute for Materials Science
(Date of publication: 2005)
https://hdl.handle.net/20.500.11932/1448695
Manifestation: 液滴工ピタキシィ法によるGaAs ドットの自己形成
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Created at: Mon, 31 Jul 2023 14:12:08 +0900
Updated at: Mon, 31 Jul 2023 14:12:08 +0900