[M] Deposition of Thin Films of Aluminum Oxide-H20 System from Aqueous Solutions at Room Temperature

著者: Ito, Shigeru Shin, Yukiko Sato, Seiichi Fujii, Takashi 協力者・編者: Okamoto, Ｋ. Kita, Hidetoshi Nakayama, Noriaki Yamamoto, Setsuo Higa, Mitsuru Ohshima, Naoki Ioku, Koji Hashimo, Kazuhiko Schmidt, Helmu Ohtaki, Michitaka Terasaki, Ichiro Kajitani, Tsuyoshi Funahashi, Ryoji Akashi, Mitsuru Suda, Yasuo Aoyagi, Takao Taguchi, Takahisa Ohgushi, Hajime Tanaka, Junzo Yamashita, Kimihiro Kobayashi, Hisatoshi TaniguiroKirihara, Akiyoshi (出版日: 2004)
https://hdl.handle.net/20.500.11932/1272556

資料: Deposition of Thin Films of Aluminum Oxide-H20 System from Aqueous Solutions at Room Temperature

本棚: ウェブ (ウェブ)

貸出区分: 標準

貸出状態: 在架（利用可能）

請求記号:

原簿番号:

所蔵情報ID:

付録を含む: いいえ

閲覧に必要な権限: Guest

受入日:

業務用メモ:

受入時刻:

作成時刻: 2023/07/31 14:34:54

更新時刻: 2023/07/31 14:34:54