[M] In situ high-temperature X-ray observation of crystallization during the fabricationof non-silica(20ZnO'80Te02)glass-preform of optical devices

Creator: NUKUI Akihiko TODOROKI Shin-ichi MIYATA Masaaki BANDO Yoshio (Date of publication: 2001)
https://hdl.handle.net/20.500.11932/611563

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Collection:	元素戦略ライブラリー
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Language:	unknown
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Identifier:	Handle URI: https://hdl.handle.net/20.500.11932/611563
Full-text file	367OCR.pdf (0.24 MB) NIMS Read Only License: Prohibit Commercial Use (NIMS only)
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