[M] Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California

John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Creator: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing Symposium Warlaumont, John M. Society of Photo-optical Instrumentation Engineers Semiconductor Equipment and Materials International Publisher: SPIE (Date of publication: 1995)

Manifestation: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California

Shelf: Books 22 (Namiki)

Checkout type: 標準

Circulation status: Available On Shelf

Call number: 621.385.833|Ｗ|9835

Register number:

Item identifier: 216893

Include supplements: No

Required role: Guest

Acquired at: March 05, 1996

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Created at: Wed, 15 Dec 2010 23:26:04 +0900

Updated at: Mon, 15 Dec 2025 09:44:30 +0900