資料の表示
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Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California 
John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
著者: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing Symposium Warlaumont, John M. Society of Photo-optical Instrumentation Engineers Semiconductor Equipment and Materials International 出版者: SPIE
| 代替タイトル: | Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing 5 |
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| 形態: |
冊子体
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| 言語: | English |
| ページ数と大きさ: | vii, 450 p. ; 28 cm |
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ISBN: 9780819417855
NCID: BC06573165
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| 注記: |
Includes bibliographical references and index |
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