Showing Item
[M]
Chemical Vapor Deposition of Tungsten and Tungsten Silicides : For VLSI/ULSI Applications Technology
Creator: by John E.J. Schmitz Publisher: Noyes Publications
(Date of publication: 1992-01-01)
Manifestation: Chemical Vapor Deposition of Tungsten and Tungsten Silicides : For VLSI/ULSI Applications
Checkout type: 標準
Circulation status: Available On Shelf
Call number: 661.8...|S|11502
Register number:
Item identifier: 218914
Include supplements: No
Required role: Guest
Acquired at: July 25, 2001
Note:
Accepted at:
Created at: Wed, 15 Dec 2010 23:38:58 +0900
Updated at: Mon, 15 Dec 2025 09:46:47 +0900