[M] Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.

editors, H.R. Huff ... [et al.]
Creator: Huff, Howard R. Publisher: Materials Research Society (Date of publication: 1999)

Manifestation: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.

Shelf: Journal Archives 60 (Namiki)

Checkout type: 標準

Circulation status: Available On Shelf

Call number: MRS|P|567

Register number:

Item identifier: 218361

Include supplements: No

Required role: Guest

Acquired at: June 02, 2000

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Accepted at:

Created at: Wed, 15 Dec 2010 23:55:22 +0900

Updated at: Wed, 03 Dec 2025 16:34:35 +0900