[M] Preparation of aluminum oxide films at low temperatures by a hot wall technique

Creator: AZUMA Naoto TERADA Tomoaki ISHINO Kenei NAKAMURA Takato FUJIYASU Hiroshi UENO Akifumi MOMOSE Yoshimi AOKI Toru NAKANISHI Yoichiro (Date of publication: 2001)
https://hdl.handle.net/20.500.11932/616568

Manifestation: Preparation of aluminum oxide films at low temperatures by a hot wall technique

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Created at: Mon, 31 Jul 2023 14:15:30 +0900

Updated at: Mon, 31 Jul 2023 14:15:30 +0900