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[M] Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro-and Nanoelectronics: MRS Vol.990 Vol.990 Vol.990
Creator: editors, Qinghuang Lin, E. Todd Ryan, Wen-li Wu, Do Yeung Yoon Publisher: Materials Research Society (MRS)
(Date of publication: 2007)
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Number: | Volume number: Vol.990 |
Form: | Volume |
Language: | English |
Physical description: | 338p; 24cm |
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Identifier: | ISBN: 9781558999503 |
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Item identifier | Library | Shelf | Call number | Circulation status |
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211011 | Sengen | Proceedings 26 | MRS|P|12456 | Available On Shelf |