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Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A. 
editors, H.R. Huff ... [et al.]
Creator: Huff, Howard R. Publisher: Materials Research Society (Date of publication: 1999)
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Volume
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| Language: | English |
| Physical description: | xvii, 615 p. ; 24 cm |
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ISBN: 9781558994744
NCID: BA43280580
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Includes bibliographical references |
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| Item identifier | Library | Shelf | Call number | Circulation status |
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| 218361 | Namiki |
Journal Archives 60 
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MRS|P|567 | Available On Shelf |