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Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics : Symposium held April 5-8, 1999,San Francisco, California, U.S.A. ; MRS Vol.567 Vol.567 Vol.567 
Creator: editors, H.R. Huff, C.A. Richter, M.L. Green [et al.] Publisher: Materials Research Society (MRS)
(Date of publication: 1999)
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| Number: | Volume number: Vol.567 |
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Volume
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| Language: | English |
| Physical description: | 615p; 24cm |
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| Identifier: | ISBN: 9781558994744 |
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| Item identifier | Library | Shelf | Call number | Circulation status |
|---|---|---|---|---|
| 218361 | Sengen |
Proceedings 26 
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MRS|P|11095 | Available On Shelf |