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[M] Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California Volume

John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Creator: Publisher: SPIE

Titlte alternative: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing 5
Series statement:
  • Proceedings v. 2437
Form: Volume Volume
Language: English
Physical description: vii, 450 p. ; 28 cm
Subject:
Classification:
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Identifier: ISBN: 9780819417855
Abstract:

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Includes bibliographical references and index

Item identifier Library Shelf Call number Circulation status
216893 Sengen Books 11 Picture 621.385.833|W|9835 Available On Shelf