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Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California 
John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Creator: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing Symposium Warlaumont, John M. Society of Photo-optical Instrumentation Engineers Semiconductor Equipment and Materials International Publisher: SPIE (Date of publication: 1995)
| Titlte alternative: | Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing 5 |
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Volume
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| Language: | English |
| Physical description: | vii, 450 p. ; 28 cm |
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ISBN: 9780819417855
NCID: BC06573165
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Includes bibliographical references and index |
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